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Wafer Polishing
Glanzox PDF Print E-mail

With the increasing integration of semiconductor devices and the larger size of wafers, a silicon surface that is free of damage, haze and heavy metal contamination, as well as flat, and nanotopographically mirror-like is essential. 

Fujimi's GLANZOX series was developed to meet such requirements. GLANZOX polish consists of colloidal silica dispersed in a liquid composed of special ingredients. This product results in an almost perfectly polished surface. In response to the recent demand for considerable reductions in the metal impurities that affect device characteristics, higher grades of polish containing ultrapure colloidal silica have been developed.

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Compol PDF Print E-mail

COMPOL is a colloidal silica slurry developed especially for polishing metals, ceramics and electronic substrates such as LiTa03, LiNb03 and sapphire. With excellent particle uniformity and dispersal, it delivers high-removal rate, damage free polishing. COMPOL-50AD and COMPOL-50S combine colloidal silica slurry with special organic amines, specifically designed for high-removal rate primary and secondary polishing of silicon wafer. Even when used at high dilutions, COMPOL delivers excellent processing efficiency and long slurry life.


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Surfin Polishing Pads PDF Print E-mail

SURFIN polishing pads are used for precision polishing of silicon wafers and semiconductor crystals, metals and glasses. Building on its expertise and research in abrasive materials and knowledge of raw materials as well as technology to control particles, Fujimi has expanded its capabilities to offer such products as insulation coatings for electron guns and catalyst carriers for pollution control.


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